Electrical Characterization of Charge Polarity in AlF₃ Anti-Reflection Layers for Complementary Metal Oxide...

In this study, the charge polarity of aluminum fluoride (AlF3) as a function of varying thickness (tAlF3 = 20, 35, 50, 65, and 80 nm) was discussed. AlF3 films were deposited onto p-Si wafers via electron beam sputtering. Thickness dependent charge polarity and reliability issues under bias-temperature stress conditions were identified using a capacitance-voltage (C-V) characterization method. AlF3 was found to possess negative fixed charges, leading to a C-V curve shift toward the positive gate bias direction as tAlF3 was increased up to 50 nm. On the contrary, the C-V characteristics were dominantly affected by the positive charges of mobile ions and/or fluorine vacancies when tAlF3 was increased to more than 50 nm. Additionally, negative bias temperature stress (1 MV/cm, 473 K for 10 mins) increased insulator trapped charges and decreased interface traps in 20 nm thick AlF3 films. These results could be attributed to positively charged fluorine vacancies introduced by broken Al-F bonds within AlF3 films and the passivation of Si dangling bonds due to broken fluorine ions at the interface, respectively. It was believed that 20 nm thick AlF3 films sufficiently attracted holes from the Si substrate, forming a hole accumulation layer on the surface due to total charge polarity of the AlF3 dielectric being entirely governed by negative fixed charges as the thickness of AlF3 decreased. Based on these results, AlF3 films are proposed for use as an anti-reflection layer to replace HfO2 in CMOS image sensors.