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Computer-Assisted Design of a Superior Be2BO3F Deep-Ultraviolet Nonlinear-Optical Material
Qiang Bian1,2, Zhihua Yang1, Yanchao Wang3
1CAS Key Laboratory of Functional Materials and Devices for Special Environments, and Xinjiang Key Laboratory of Electronic Information Materials and Devices , Xinjiang Technical Institute of Physics & Chemistry of Chinese Academy of Sciences , 40-1 South Beijing Road , Urumqi 830011 , China.
Abstract:
Deep-ultraviolet (DUV) nonlinear-optical (NLO) materials generating coherent DUV light by a direct second-harmonic-generation (SHG) process have long been pursued as industrially useful lasers. For several decades, KBe2BO3F2 (KBBF) has been regarded as the best DUV-NLO material; it is characterized by a short DUV phase-matching edge of 161 nm and a large SHG coefficient of 0.47 pm/V. However, it suffers a strong layering tendency, hindering the growth of large crystals for commercial use. Here, we use a computer-aided swarm structure searching technique to design an alternative DUV-NLO material with a new atmospheric-pressure phase Be2BO3F2 with a P6̅2 c space group (γ-BBF) that outperforms the DUV-NLO properties of KBBF. The predicted DUV phase-matching edge and SHG coefficient of γ-BBF are 152 nm and 0.70 pm/V, respectively. The structure of γ-BBF reduces the layering tendency compared with KBBF because of the absence of K atoms in the γ-BBF crystal. Our work paves the way for superior DUV-NLO materials that can be grown as large crystals for commercial applications.
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