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Updated: Feb 7, 2026
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Atomically Traceable Nanostructure Fabrication
Published on: July 17, 2015
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Development of a tomographic Mueller-matrix scatterometer for nanostructure metrology
Yinyin Tan1, Chao Chen1, Xiuguo Chen1
1State Key Laboratory of Digital Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan 430074, China.
The Review of Scientific Instruments
|August 3, 2018
Summary
A new tomographic Mueller-matrix scatterometer (TMS) was developed to measure nanostructures. This instrument characterizes polarized scattered light, advancing nanostructure metrology and nanomanufacturing applications.
Area of Science:
- Optical Metrology
- Nanotechnology
- Scattering Theory
Background:
- Accurate characterization of nanostructures is crucial for advanced manufacturing.
- Polarized light scattering provides rich information about material properties at the nanoscale.
Purpose of the Study:
- To develop a novel instrument, the tomographic Mueller-matrix scatterometer (TMS), for comprehensive nanostructure metrology.
- To enable detailed characterization of polarized scattered-field distributions.
Main Methods:
- Sequential illumination of samples with varying plane wave directions.
- Recording scattering Mueller matrices across wide scattering and azimuthal angles (0°-67° and 0°-360°).
- Utilizing an inverse scattering problem-solving technique for nanostructure measurement.
Main Results:
- Demonstrated the performance of the TMS instrument through an experiment on a periodic nanostructure.
- Preliminary validation of the TMS for nanostructure metrology.
Conclusions:
- The developed TMS is a powerful tool for characterizing polarized scattered-field distributions.
- The TMS shows significant potential for precise nanostructure measurement in nanomanufacturing.
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