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Updated: Feb 5, 2026

Effect of Bending on the Electrical Characteristics of Flexible Organic Single Crystal-based Field-effect Transistors
Published on: November 7, 2016
Ge₂Sb₂Te₅ p-Type Thin-Film Transistors on Flexible Plastic Foil
Alwin Daus1, Songyi Han2, Stefan Knobelspies3
1Electronics Laboratory, Department of Information Technology and Electrical Engineering, 8092 Zürich, Switzerland. daus.alwin@gmail.com.
Thin-film transistors (TFTs) using germanium antimony telluride (Ge2Sb2Te5) show improved performance on flexible substrates. Downscaling GST thickness enhances ON/OFF ratios and current modulation for flexible electronics.
Area of Science:
- Materials Science
- Electronics Engineering
- Semiconductor Physics
Background:
- Prior germanium antimony telluride (Ge2Sb2Te5) thin-film transistors (TFTs) exhibited limited current modulation (ON/OFF ratios ≤20) and non-saturating output characteristics.
- High-performance p-type TFTs are crucial for developing hybrid complementary metal-oxide-semiconductor (CMOS) technologies on flexible substrates.
Purpose of the Study:
- To investigate the performance enhancement of p-type Ge2Sb2Te5 (GST) TFTs on flexible polyimide substrates by downscaling GST layer thickness.
- To evaluate the impact of GST thickness and phase (amorphous vs. crystalline) on TFT characteristics, including ON/OFF ratio, mobility, and saturation.
- To assess the operational stability and mechanical robustness of these flexible TFTs.
Main Methods:
- Fabrication of p-type TFTs utilizing varying thicknesses of Ge2Sb2Te5 (GST) semiconductor layers on flexible polyimide substrates.
- Characterization of TFT performance in both as-deposited (amorphous) and annealed (crystalline at 200°C) states.
- Evaluation of device performance under mechanical bending stress (radius of 6 mm) and bias stress.
Main Results:
- Reducing GST thickness to 5 nm significantly improved performance, achieving ON/OFF ratios up to ≈300 and enabling drain current saturation.
- The highest effective field-effect mobility of 6.7 cm²/Vs was observed in 10-nm-thick crystalline GST TFTs (ON/OFF ratio ≈16).
- Amorphous GST TFTs (5 nm) exhibited a mobility of 0.04 cm²/Vs and were more susceptible to bias stress compared to crystalline counterparts.
- Devices maintained full functionality after bending to a 6 mm radius.
Conclusions:
- Downscaling GST thickness is an effective strategy to enhance the performance of p-type TFTs for flexible electronics.
- Germanium antimony telluride (GST) demonstrates compatibility with flexible electronics, offering a promising material for p-type channel applications in hybrid CMOS technology.
- The study highlights the potential of GST TFTs for applications requiring high-performance, flexible, and robust semiconductor devices.
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