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New Route for "Cold-Passivation" of Defects in Tin-Based Oxides

Esteban Rucavado1, Miglė Graužinytė2, José A Flores-Livas2

  • 1Institute of Microengineering (IMT), Photovoltaics and Thin-Film Electronics Laboratory, École Polytechnique Fédérale de Lausanne (EPFL), Neuchâtel CH-2002, Switzerland.

Summary

Silicon dioxide (SiO2) cosputtering offers a low-temperature method to improve transparent conductive oxides (TCOs). This technique enhances optical properties of tin-based TCOs without compromising electrical conductivity.

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