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Published on: July 26, 2016
Atomic layer deposition for membrane interface engineering
Hao-Cheng Yang1, Ruben Z Waldman2, Zhaowei Chen3
1School of Chemical Engineering and Technology, Sun Yat-Sen University, Zhuhai, 519082, China.
Abstract:
In many applications, interfaces govern the performance of membranes. Structure, chemistry, electrostatics, and other properties of interfaces can dominate the selectivity, flux, fouling resistance, and other critical aspects of membrane functionality. Control over membrane interfacial properties, therefore, is a powerful means of tailoring performance. In this Minireview, we discuss the application of atomic layer deposition (ALD) and related techniques in the design of novel membrane interfaces. We discuss recent literature in which ALD is used to (1) modify the surface chemistry and interfacial properties of membranes, (2) tailor the pore sizes and separation characteristics of membranes, and (3) enable novel advanced functional membranes.
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