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Related Experiment Video

Updated: Feb 3, 2026

Epitaxial Growth of Perovskite Strontium Titanate on Germanium via Atomic Layer Deposition

Epitaxial Growth of Perovskite Strontium Titanate on Germanium via Atomic Layer Deposition

Published on: July 26, 2016

Atomic layer deposition for membrane interface engineering.

Hao-Cheng Yang¹, Ruben Z Waldman², Zhaowei Chen³

¹School of Chemical Engineering and Technology, Sun Yat-Sen University, Zhuhai, 519082, China.

|November 7, 2018

Summary

This summary is machine-generated.

Atomic layer deposition (ALD) precisely controls membrane interfaces, enhancing selectivity, flux, and fouling resistance. This technique enables the design of advanced functional membranes with tailored properties for diverse applications.

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Area of Science:

Materials Science
Chemical Engineering
Surface Chemistry

Background:

Membrane performance is critically dependent on interfacial properties like structure, chemistry, and electrostatics.
Controlling these interfacial characteristics offers a powerful method for optimizing membrane functionality, including selectivity, flux, and fouling resistance.

Purpose of the Study:

To review the application of atomic layer deposition (ALD) and related techniques in designing novel membrane interfaces.
To highlight recent literature demonstrating ALD's utility in modifying membrane surface chemistry and interfacial properties.
To showcase ALD's role in tailoring membrane pore sizes and separation characteristics, and enabling advanced functional membranes.

Main Methods:

Review of recent scientific literature focusing on atomic layer deposition (ALD) applications in membrane science.
Analysis of studies employing ALD for surface modification and interface engineering of various membrane types.

Main Results:

ALD effectively modifies membrane surface chemistry and interfacial properties.
ALD enables precise control over membrane pore sizes, influencing separation characteristics.
ALD facilitates the development of novel advanced functional membranes with enhanced performance.

Conclusions:

Atomic layer deposition is a versatile technique for engineering membrane interfaces.
ALD provides precise control over membrane properties, leading to improved performance in selectivity, flux, and fouling resistance.
ALD opens new avenues for designing advanced functional membranes tailored for specific applications.