Ions as Acids and Bases
Masonry Curtain Walls
Distance Corrections
Common Ion Effect
Beams
Power Factor Correction
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Updated: Feb 1, 2026

Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes
Published on: January 19, 2020
Christopher W Schankula1, Christopher K Anand1, Nabil D Bassim2
11Department of Computing and Software,McMaster University,1280 Main St. W, Hamilton, ON L8S 4L8,Canada.
We developed a new model to fix image artifacts in plasma focused ion beam scanning electron microscopy (PFIB-SEM). This method corrects multi-angle curtaining effects, improving 3D imaging for materials science.
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