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Fabrication of Uniform Nanoscale Cavities via Silicon Direct Wafer Bonding
Published on: January 9, 2014
Clarissa Convertino1, Cezar Zota2, Heinz Schmid3
1IBM Research GmbH Zürich, Säumerstrasse 4, CH-8803 Rüschlikon, Switzerland. ino@zurich.ibm.com.
III-V semiconductors like Indium Gallium Arsenide (InGaAs) show promise for advanced transistors. Researchers developed InGaAs FinFETs on silicon using template-assisted selective epitaxy, achieving high performance for future electronics.
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