Related Experiment Video
Updated: Jan 30, 2026

The Effect of Anodization Parameters on the Aluminum Oxide Dielectric Layer of Thin-Film Transistors
Published on: May 24, 2020
Ultra-Low Specific On-resistance Lateral Double-Diffused Metal-Oxide-Semiconductor Transistor with Enhanced Dual-Gate
Zhuo Wang1, Zhangyi'an Yuan1, Xin Zhou2
1State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu, 610054, Sichuan, China.
Abstract:
An ultra-low specific on-resistance (Ron,sp) lateral double-diffused metal-oxide-semiconductor transistor (LDMOS) with enhanced dual-gate and partial P-buried layer is proposed and investigated in this paper. On-resistance analytical model for the proposed LDMOS is built to provide an in-depth insight into the relationship between the drift region resistance and the channel region resistance. N-buried layer is introduced under P-well to provide a low-resistance conduction path and reduce the resistance of the channel region significantly. Enhanced dual-gate structure is formed by N-buried layer while avoiding the vertical punch-through breakdown in off-state. Partial P-buried layer with optimized length is adopted under the N-drift region to extend vertical depletion region and relax the electric field peak in off-state, which enhances breakdown voltage (BV) with low drift region resistance. For the LDMOS with enhanced dual-gate and partial P-buried layer, the result shows that Ron,sp is 8.5 mΩ·mm2 while BV is 43 V.
Related Concept Videos
Metal-Semiconductor Junctions
Schottky Barriers
Schottky barriers arise when a metal with a work function (Φm) contacts a semiconductor with a different work function (Φs). Initially, electrons transfer until the Fermi levels of the metal and semiconductor align at equilibrium. For instance, if Φm > Φs, the semiconductor Fermi level is higher than the metal's before contact. The...
Biasing of Metal-Semiconductor Junctions
In Schottky junctions, where the semiconductor is n-type, applying a positive voltage to the metal relative to the semiconductor reduces its Fermi...
Oxidation Numbers
Theories of Dissolution: Diffusion Layer Model
This process starts with a thin layer, saturated with the drug, forming at the interface between the solid and liquid. The solute then diffuses from this layer into the main solution. The Noyes-Whitney equation suggests that the rate of dissolution relies on the diffusion...
Oxidation-Reduction Reactions
Properties of Transition Metals

