Steep-slope field-effect transistors with AlGaN/GaN HEMT and oxide-based threshold switching device

Xuanqi Huang1, Runchen Fang1,2, Chen Yang1

  • 1School of Electrical, Computer & Energy Engineering, Arizona State University, Tempe, AZ 85287, United States of America.

Nanotechnology
|February 6, 2019
PubMed
Summary

Researchers developed a steep-slope transistor using aluminum gallium nitride/gallium nitride (AlGaN/GaN) metal-insulator-semiconductor high-electron-mobility transistors (MIS-HEMTs) with silicon dioxide (SiO2) threshold switching devices. This innovation achieves ultra-low subthreshold swing for efficient power electronics.

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