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Steep-slope field-effect transistors with AlGaN/GaN HEMT and oxide-based threshold switching device
Xuanqi Huang1, Runchen Fang1,2, Chen Yang1
1School of Electrical, Computer & Energy Engineering, Arizona State University, Tempe, AZ 85287, United States of America.
Researchers developed a steep-slope transistor using aluminum gallium nitride/gallium nitride (AlGaN/GaN) metal-insulator-semiconductor high-electron-mobility transistors (MIS-HEMTs) with silicon dioxide (SiO2) threshold switching devices. This innovation achieves ultra-low subthreshold swing for efficient power electronics.
Area of Science:
- Materials Science and Engineering
- Semiconductor Device Physics
- Electronics and Electrical Engineering
Background:
- Traditional transistors face limitations in achieving steep switching characteristics, impacting energy efficiency.
- Metal-insulator-semiconductor high-electron-mobility transistors (MIS-HEMTs) offer potential for high-performance electronics.
- Silicon dioxide (SiO2) based threshold switching devices show promise for novel electronic functionalities.
Purpose of the Study:
- To demonstrate a steep-slope field-effect transistor by integrating SiO2-based threshold switching devices with AlGaN/GaN MIS-HEMTs.
- To investigate the electrical characteristics, including subthreshold swing, leakage current, and ON/OFF ratio, of the integrated device.
- To assess the repeatability and potential applications of the developed steep-slope transistor.
Main Methods:
- Fabrication of AlGaN/GaN MIS-HEMTs integrated with series-connected SiO2-based threshold switching devices.
- Characterization of the integrated device's transfer characteristics at room temperature.
- Analysis of subthreshold swing, transition range, leakage current, and ON/OFF ratio.
Main Results:
- Achieved a steep-slope transistor with a subthreshold swing below 5 mV/dec and a transition range exceeding 10^5.
- Demonstrated low leakage current (10^-5 μA/μm) and a high ON/OFF current ratio (>10^7).
- Observed good repeatability (average steep slopes < 10 mV/dec) and a positive shift in threshold voltage.
Conclusions:
- The integration of SiO2-based threshold switching devices with AlGaN/GaN MIS-HEMTs successfully creates a steep-slope transistor.
- The developed device exhibits excellent switching performance, low leakage, and high ON/OFF ratio, suitable for power electronics.
- This approach is extendable to other transistor platforms (Si, III-V) and holds potential for power switching and high-frequency applications.
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