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Measuring chromatic aberration in LEEM/PEEM
1IBM T.J. Watson Research Center, 1101 Kitchawan Road, P.O. Box 218, Yorktown Heights, NY 10598, United States.
Ultramicroscopy
|February 18, 2019
Summary
A new method simplifies measuring chromatic aberration in Low Energy Electron Microscopes (LEEM) and Photo Electron Emission Microscopes (PEEM). This technique is accurate and easily implemented, aiding quantitative image analysis and aberration correction.
Area of Science:
- Electron microscopy
- Optical physics
- Materials science
Background:
- Quantitative image interpretation in LEEM/PEEM requires accurate chromatic aberration measurement.
- Measuring chromatic aberration (Cc) is more challenging than spherical aberration (C3).
Purpose of the Study:
- To introduce a novel and simplified method for measuring chromatic aberration in LEEM/PEEM.
- To validate the method's accuracy and practicality for scientific applications.
Main Methods:
- Development of a new measurement technique for chromatic aberration.
- Validation through detailed electron-optical ray-tracing calculations.
- Experimental verification of the method's ease of implementation.
Main Results:
- The novel method significantly simplifies the measurement of chromatic aberration.
- Ray-tracing calculations confirm the method's viability and accuracy.
- Experimental results demonstrate the practical applicability of the technique.
Conclusions:
- The developed method offers an accessible approach to measuring chromatic aberration in LEEM/PEEM.
- This advancement facilitates more accurate quantitative imaging and aberration correction in electron microscopy.
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