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    Area of Science:

    • Photonics
    • Materials Science
    • Nanotechnology

    Background:

    • Silicon nitride (SiNx) and silicon (Si) are key materials in integrated photonics.
    • Significant refractive index mismatch between SiNx (~2) and Si (~3.42) poses challenges for efficient light coupling.
    • Minimizing insertion loss and crosstalk is crucial for advanced photonic integrated circuits.

    Purpose of the Study:

    • To develop an efficient interlayer coupler for SiNx-Si interfaces using metamaterials.
    • To overcome the refractive index mismatch between SiNx and Si.
    • To enable robust three-dimensional (3D) photonic integration.

    Main Methods:

    • Employed a gradient index (GRIN) metamaterial (MM) for refractive index matching.
    • Designed a two-layer SiNx interlayer coupler to further reduce losses.
    • Fabricated and characterized a 3D SiNx-Si interlayer coupler.

    Main Results:

    • Achieved refractive index matching between SiNx and Si using GRIN MM.
    • Demonstrated a 3D SiNx-Si interlayer coupler with low insertion loss (-0.6 dB/layer).
    • Obtained a 40 nm 1-dB bandwidth (1530-1570 nm) and minimal interlayer crosstalk (<-45 dB).

    Conclusions:

    • The GRIN MM-based SiNx-Si interlayer coupler effectively minimizes coupling loss and crosstalk.
    • This technology shows significant potential for advancing 3D photonic integration.
    • The developed coupler facilitates seamless integration of SiNx and Si photonic components.