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Updated: Jan 26, 2026

The Effect of Anodization Parameters on the Aluminum Oxide Dielectric Layer of Thin-Film Transistors
Published on: May 24, 2020
Design and analysis of IGZO thin film transistor for AMOLED pixel circuit using double-gate tri active layer channel
Shashi K Dargar1, Viranjay M Srivastava1
1Department of Electronic Engineering, Howard College, University of KwaZulu-Natal, Durban, 4041, South Africa.
Abstract:
In this research work, Amorphous Indium-Gallium-Zinc-Oxide (α-IGZO) thin-film transistor consisting of Tri-Active Layer (TAL) channel have been designed in a double-gate structure. The electrical performance of the novel device structure has been analyzed with its output and transfer characteristics, at different overlap and offset length between gate and Source-Drain (S-D) contacts. The resulted parameters have a better agreement to the device characteristics including high ION/IOFF at offset of the thin-film transistor (TFT) of order 10 , high channel mobility is 16.08 cm /V.s in overlap, while it is less than 6 cm /V.s for the offset TFTs. The superior electrical behavior of the novel double-gate TAL TFT have been incorporated. Later on, the device application in a new Active Matrix -Organic Light Emitting Diode (AMOLED) pixel circuit has been proposed.
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