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Novel High Holding Voltage SCR with Embedded Carrier Recombination Structure for Latch-up Immune and Robust ESD
Zhuo Wang1, Zhao Qi2, Longfei Liang1
1State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu, 610054, Sichuan, China.
Abstract:
A novel CMOS-process-compatible high-holding voltage silicon-controlled rectifier (HHV-SCR) for electrostatic discharge (ESD) protection is proposed and demonstrated by simulation and transmission line pulse (TLP) testing. The newly introduced hole (or electron) recombination region H-RR (or E-RR) not only recombines the minority carrier in parasitic PNP (or NPN) transistor base by N+ (or P+) layer, but provides the additional recombination to eliminate the surface avalanche carriers by newly added P+ (or N+) layer in H-RR (or E-RR), which brings about a further improvement of holding voltage (Vh). Compared with the measured Vh of 1.8 V of low-voltage triggered silicon-controlled rectifier (LVTSCR), the Vh of HHV-SCR can be increased to 8.1 V while maintaining a sufficiently high failure current (It2 > 2.6 A). An improvement of over four times in the figure of merit (FOM) is achieved.
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