Single step fabrication of nano scale optical devices using binary contact mask deep UV interference lithography

Area of Science:

• Nanotechnology
• Optics
• Materials Science

Background:

• Interference Lithography (IL) is a cost-effective method for large-area nanoscale patterning.
• IL traditionally produces periodic structures, limiting design flexibility.

Purpose of the Study:

• To extend Interference Lithography (IL) capabilities for arbitrary nanoscale feature fabrication.
• To demonstrate the versatility of IL with binary masks for advanced applications.

Main Methods:

• Utilized wavefront division deep-UV interference lithography with binary contact masks.
• Developed a method to create features in arbitrary shapes and locations.

Main Results:

• Successfully fabricated grating couplers and a focal plane division polarimeter.
• Demonstrated simultaneous fabrication of 90nm and 20μm features, showcasing process scalability.
• Proved the technique's viability for complex nanoscale patterning.

Conclusions:

• The enhanced IL technique significantly broadens the scope of nanoscale fabrication.
• This method offers a streamlined approach for both research and industrial applications.
• The ability to create arbitrary patterns simplifies and accelerates the development of optical and measurement devices.