Robust Tracking of a Cost-Effective Micro-Stereolithography System Based on a Compliant Nanomanipulator

Micro-stereolithography (MSL) has emerged as a promising and challenging technique in micro-/nano-scale additive manufacturing. Besides the requirement of the light source, the motion system requires ultra-high-precision tracking capability to reach the right location for every solidification event. To achieve single-digit micron feature size of the fabrication, we propose a robust control strategy to support a self-developed cost-effective MSL prototype based on a compliant nanomanipulator and a blue light-emitting diode (LED) module. In particular, the nonlinearity and parameter-variation of the compliant manipulator are dealt with by a robust radial basis function (RBF)-based neural network, and the repetitive control (RC) is innovatively integrated with RBF to improve the tracking performance of a closed pattern. Various simulations and real-time experiments are conducted to validate the proposed control strategy. The fabrication of a closed pattern will not begin by turning on the laser source until the tracking error reaches submicrons, and the fabrication results demonstrate that the cost-effective MSL system is capable of fabricating 2.5 µm feature size in a 0.5 mm working range.