Towards smart scanning probe lithography: a framework accelerating nano-fabrication process with in-situ
Yijie Liu1,2, Xuexuan Li1,2, Ben Pei3,4,5
1State Key Laboratory of Tribology in Advanced Equipment, Department of Mechanical Engineering, Tsinghua University, Beijing, 100084 China.
Microsystems & Nanoengineering
|October 13, 2023
Summary
This study introduces a machine learning (ML) framework to optimize scanning probe lithography (SPL) parameters for improved nano-fabrication quality and feature measurement. The ML approach enables precise control over critical dimensions and large-scale direct-write nano-lithography.
Area of Science:
- Nanotechnology
- Materials Science
- Machine Learning
Background:
- Scanning probe lithography (SPL) offers nanoscale fabrication but faces challenges in quality control and subjective feature measurement.
- Process parameters significantly impact nano-fabrication critical dimensions in SPL.
Purpose of the Study:
- To develop a novel machine learning (ML) framework for optimizing SPL process parameters and segmenting nano-fabricated features.
- To overcome the limitations of traditional manual labeling-based experimental methods in SPL.
Main Methods:
- Utilized a machine learning framework for intelligent extraction of global information for statistical analysis.
- Applied the framework to fine-tune and optimize SPL process parameters for enhanced nano-fabrication.
Main Results:
- Achieved processing of smaller critical dimensions through optimized SPL process parameters.
- Successfully performed large-scale direct-write nano-lithography.
- Demonstrated data-driven feature extraction and analysis for fabrication quality optimization.
Conclusions:
- The proposed ML framework effectively optimizes SPL process parameters, leading to improved nano-fabrication precision and scale.
- This data-driven approach offers potential guidance for other characterization methods and fabrication quality enhancement.
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