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Related Concept Videos

Step-Growth Polymerization: Overview01:03

Step-Growth Polymerization: Overview

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Step-growth or condensation polymerization is a stepwise reaction of bi or multifunctional monomers to form long-chain polymers. As all the monomers are reactive, most of the monomers are consumed at the early stages of the reaction to form small chains of reactive oligomers, which then combine to form long polymer chains in the late stages. Hence, the reaction has to proceed for a long time to achieve high molecular weight polymers.
Many natural and synthetic polymers are produced by...
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Anionic Chain-Growth Polymerization: Overview01:20

Anionic Chain-Growth Polymerization: Overview

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The polymerization process that involves carbanion as an intermediate is called anionic polymerization. It is also a type of addition or chain-growth polymerization. Anionic polymerization gets initiated by a strong nucleophile such as an organolithium or a Grignard reagent. The most commonly used initiator for anionic polymerization is butyl lithium. Monomers involved in anionic polymerization must possess a vinyl group bonded to one or two electron-withdrawing groups. For instance,...
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Polymers02:34

Polymers

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The word polymer is derived from the Greek words “poly” which means “many” and “mer” which means “parts”. Polymers are long chains of molecules composed of repeating units of smaller molecules, known as monomers. They either occur naturally, such as DNA and proteins, or can be constructed synthetically, like plastics. They have varied structural characteristics, such as linear chains, branched chains, or complex networks, that contribute to the...
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Radical Chain-Growth Polymerization: Overview01:10

Radical Chain-Growth Polymerization: Overview

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Chain-growth or addition polymerization is successive addition reactions of monomers with a polymer chain. In radical chain-growth polymerization, the reaction proceeds via a free-radical intermediate. The free radical is formed from radical initiators, which spontaneously generate free radicals by homolytic fission. Organic peroxides (such as dibenzoyl peroxide, as shown in Figure 1) or azo compounds are popular radical initiators. A low concentration ratio of radical initiator to monomer is...
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Ziegler–Natta Chain-Growth Polymerization: Overview01:17

Ziegler–Natta Chain-Growth Polymerization: Overview

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Ziegler–Natta polymerization is another form of addition or chain‐growth polymerization used for synthesizing linear polymers over branched polymers. The catalyst used for polymerization is the Ziegler–Natta catalyst, named after Karl Ziegler and Giulio Natta, who developed it in 1953. This catalyst is an organometallic complex of titanium tetrachloride and triethyl aluminum, with the active form of the catalyst being an alkyl titanium compound. Using the Ziegler–Natta...
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Olefin Metathesis Polymerization: Overview01:13

Olefin Metathesis Polymerization: Overview

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Recently, the development of olefin metathesis polymerization advanced the field of polymer synthesis. Simply put, the reorganization of substituents on their double bonds between two olefins in the presence of a catalyst is known as the olefin metathesis reaction. The use of metathesis reaction for polymer synthesis is called olefin metathesis polymerization.
Ruthenium-based Grubbs catalyst is the most commonly used catalyst for olefin metathesis polymerization. Grubbs catalyst consists of a...
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Updated: Dec 28, 2025

Facile Synthesis of Worm-like Micelles by Visible Light Mediated Dispersion Polymerization Using Photoredox Catalyst
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Two-Photon-Assisted Polymerization and Reduction: Emerging Formulations and Applications.

Chee Leng Lay1,2, Charlynn Sher Lin Koh1, Yih Hong Lee1

  • 1Division of Chemistry and Biological Chemistry, School of Physical and Mathematical Sciences, Nanyang Technological University, 21 Nanyang Link, Singapore 637371, Singapore.

ACS Applied Materials & Interfaces
|February 11, 2020
PubMed
Summary

Two-photon lithography (TPL) advances micro/nanostructure fabrication through innovative photoresist development. This review highlights progress and challenges in creating advanced materials for diverse applications.

Keywords:
3D nanofabricationdirect metal writinghydrogel/organogel photoresistsmetal salt-based photoresiststwo-photon lithographytwo-photon polymerizationtwo-photon reduction

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Area of Science:

  • Materials Science
  • Nanotechnology
  • Chemical Engineering

Background:

  • Two-photon lithography (TPL) enables complex 2D and 3D micro/nanostructure fabrication.
  • A growing variety of photoresists are available for TPL, allowing diverse material creation.
  • Challenges in photoresist formulation currently limit TPL's full potential.

Purpose of the Study:

  • To critically review the significance of photoresist formulation in TPL.
  • To evaluate current photoresist technologies and their applications.
  • To discuss emerging photoresist materials and future challenges.

Main Methods:

  • Review of commercial photoresists for applications like anti-counterfeiting and micromachines.
  • Discussion of hydrogel/organogel photoresists for reconfigurable structures.
  • Analysis of metal salt-based photoresists for direct metal writing.

Main Results:

  • Commercial photoresists facilitate micro/nanostructures for anti-counterfeiting, superomniphobicity, and movable micromachines.
  • Customizable hydrogel/organogel photoresists enable stimuli-responsive reconfigurable structures.
  • Metal salt-based photoresists support direct metal writing for sensing, catalysis, and electronics.

Conclusions:

  • Photoresist formulation is crucial for advancing TPL capabilities.
  • Emerging photoresist chemistries offer new possibilities for complex and functional micro/nanostructures.
  • Addressing formulation challenges is key to unlocking TPL's full potential in various applications.