Effect of the Niobium-Doped Titanium Oxide Thickness and Thermal Oxide Layer for Silicon Quantum Dot Solar Cells as a...

Silicon quantum dot (Si-QD) embedded in amorphous silicon oxide is used for p-i-n solar cell on quartz substrate as a photogeneration layer. To suppress diffusion of phosphorus from an n-type layer to a Si-QD photogeneration layer, niobium-doped titanium oxide (TiO_x:Nb) is adopted. Hydrofluoric acid treatment is carried out for a part of the samples to remove the thermal oxide layer in the interface of TiO_x:Nb/n-type layer. The thermal oxide acts as a photo-generated carrier-blocking layer. Solar cell properties using 10-nm-thick TiO_x:Nb without the thermal oxide are better than those with the thermal oxide, notably short circuit current density is improved up to 1.89 mA/cm². The photo-generated carrier occurs in Si-QD with quantum confinement effect. The 10-nm-thick TiO_x:Nb with the thermal oxide layer effectively blocks P; however, P-diffusion is not completely suppressed by the 10-nm-thick TiO_x:Nb without the thermal oxide. These results indicate that the total thickness of TiO_x:Nb and thermal oxide layer influence the P-blocking effect. To achieve the further improvement of Si-QD solar cell, over 10-nm-thick TiO_x:Nb is needed.