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Updated: Dec 18, 2025

Sample Preparation and Experimental Design for In Situ Multi-Beam Transmission Electron Microscopy Irradiation Experiments
Published on: June 27, 2022
Local heat generated by a focused He+ ion beam
Makoto Sakurai1, Shoko Nagano2, Christian Joachim1,3
1International Center for Materials Nanoarchitectonics (WPI-MANA), National Institute for Material Sciences (NIMS), 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan.
Focused helium ion (He+) beams locally heat surfaces to 1000°C, enabling direct nanomaterial sculpting. This high temperature is measured using gold nanodisks and is beneficial for resistless nanofabrication.
Area of Science:
- Materials Science
- Nanotechnology
- Surface Science
Background:
- Focused helium ion (He+) microscopy enables high-resolution imaging and modification of materials.
- Understanding localized heating effects is crucial for precise nanofabrication.
- Gold nanostructures exhibit size-dependent melting points, useful for thermometry.
Purpose of the Study:
- To quantify the localized surface temperature generated by a focused He+ beam.
- To investigate the potential of this heating for direct nanomaterial modification.
- To evaluate the feasibility of using gold nanodisks as in-situ thermometers.
Main Methods:
- Utilized a focused He+ beam with a diameter < 1 nm and a dose > 1 × 10^20 ions cm^-2.
- Fabricated gold nanodisks (20 nm diameter, 10 nm thickness) on mica and sapphire substrates.
- Determined temperature by observing the melting and vaporization of gold nanodisks based on their size-dependent melting points.
Main Results:
- Achieved localized surface temperatures up to 1000°C.
- Observed surface decomposition and chemical reactions due to localized heating.
- Demonstrated the utility of gold nanodisks for in-situ temperature measurement in the nanometer scale.
Conclusions:
- Focused He+ beams can induce significant localized heating, suitable for direct nanomaterial nano-sculpting.
- This resistless approach is advantageous on highly thermally conductive supports like sapphire.
- The method is detrimental for precise He+ nanolithography resist processes but promising for direct material modification.
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