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Related Experiment Video

Updated: Dec 11, 2025

Pattern Generation for Micropattern Traction Microscopy

Pattern Generation for Micropattern Traction Microscopy

Published on: February 17, 2022

Spacer-Defined Intrinsic Multiple Patterning.

Sophia Katharine Laney¹, Tao Li¹, Martyna Michalska¹

¹Photonic Innovations Lab, Department of Electronic & Electrical Engineering, University College London, Torrington Place, London WC1E 7JE, United Kingdom.

|August 20, 2020

Summary

This summary is machine-generated.

Researchers developed a scalable atomic layer deposition (ALD) method for precise nanotube array fabrication. This technique enables tailored dimensions and advanced functionalities like broadband antireflection for photonics and wettability applications.

Keywords:

atomic layer deposition binary/hierarchical nanostructures broadband antireflection multiple patterning nanofabrication nanotubes

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Area of Science:

Materials Science and Engineering
Nanotechnology
Optics and Photonics

Background:

Periodic nanotube arrays offer enhanced properties for applications in wettability and photonics.
Achieving optimal performance requires precise structural fine-tuning.
Existing methods lack scalability and independent control over nanotube dimensions.

Purpose of the Study:

To develop a universal and scalable method for fabricating tailored nanotube arrays with independent dimension control.
To enable the creation of complex nanoarrays, including concentric and binary structures.
To demonstrate the application of these tailored nanotube arrays in broadband antireflection.

Main Methods:

Utilized atomic layer deposition (ALD)-enabled multiple patterning.
Applied ALD-deposited spacers directly onto prepatterned substrate materials as etching masks.
Iteratively refined the process to create concentric and/or binary nanoarrays in silicon, glass, and polymers.

Main Results:

Successfully fabricated tailored nanotubes with independent dimension control and high aspect ratios.
Demonstrated the capability to produce concentric and binary nanoarrays in various materials.
Achieved broadband antireflection with reflectance below 1% across the 300-1050 nm wavelength range.

Conclusions:

The ALD-enabled multiple patterning method provides a scalable solution for fabricating complex nanotube arrays.
Fine-tuning nanotube structures significantly enhances optical properties, such as broadband antireflection.
This technique opens avenues for advanced applications in photonics, wettability, and other fields requiring precise nanostructure control.