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Effect of Quantum Hall Edge Strips on Valley Splitting in Silicon Quantum Wells
Brian Paquelet Wuetz1, Merritt P Losert2, Alberto Tosato1
1QuTech and Kavli Institute of Nanoscience, Delft University of Technology, PO Box 5046, 2600 GA Delft, Netherlands.
Abstract:
We determine the energy splitting of the conduction-band valleys in two-dimensional electrons confined to low-disorder Si quantum wells. We probe the valley splitting dependence on both perpendicular magnetic field B and Hall density by performing activation energy measurements in the quantum Hall regime over a large range of filling factors. The mobility gap of the valley-split levels increases linearly with B and is strikingly independent of Hall density. The data are consistent with a transport model in which valley splitting depends on the incremental changes in density eB/h across quantum Hall edge strips, rather than the bulk density. Based on these results, we estimate that the valley splitting increases with density at a rate of 116 μeV/10^{11} cm^{-2}, which is consistent with theoretical predictions for near-perfect quantum well top interfaces.
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