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Updated: Nov 18, 2025

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
Published on: September 14, 2018
Automated geometric aberration correction for large-angle illumination STEM
Ryo Ishikawa1, Riku Tanaka2, Shigeyuki Morishita3
1Institute of Engineering Innovation, University of Tokyo, Bunkyo, Tokyo, 113-8656, Japan; PRESTO, Japan Science and Technology Agency, Kawaguchi, Saitama 332-0012, Japan.
Abstract:
Depth resolution in scanning transmission electron microscopy (STEM) is physically limited by the illumination angle. In recent notable progress on aberration correction technology, the illumination angle is significantly improved to be larger than 60 milliradians, which is 2 or 3 times larger than those in the previous generation. However, for three-dimensional depth sectioning with the large illumination angles, it is prerequisite to ultimately minimize lower orders of aberrations such as 2- and 3-fold astigmatisms and axial coma. Here, we demonstrate a live aberration correction using atomic-resolution STEM images rather than Ronchigram images. The present method could save the required time for aberration correction, and moreover, it is possible to build up a fully automated program. We demonstrate the method should be useful not only for axial depth sectioning but also phase imaging in STEM including differential phase-contrast imaging.
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