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Preparation of Large-area Vertical 2D Crystal Hetero-structures Through the Sulfurization of Transition Metal Films for Device Fabrication
Published on: November 28, 2017
Thermal expansion coefficient of few-layer MoS2 studied by temperature-dependent Raman spectroscopy
Zhongtao Lin1,2, Wuguo Liu1,3, Shibing Tian1
1Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, P O Box 603, Beijing, 100190, People's Republic of China.
Abstract:
The thermal expansion coefficient is an important thermal parameter that influences the performance of nanodevices based on two-dimensional materials. To obtain the thermal expansion coefficient of few-layer MoS2, suspended MoS2 and supported MoS2 were systematically investigated using Raman spectroscopy in the temperature range from 77 to 557 K. The temperature-dependent evolution of the Raman frequency shift for suspended MoS2 exhibited prominent differences from that for supported MoS2, obviously demonstrating the effect due to the thermal expansion coefficient mismatch between MoS2 and the substrate. The intrinsic thermal expansion coefficients of MoS2 with different numbers of layers were calculated. Interestingly, negative thermal expansion coefficients were obtained below 175 K, which was attributed to the bending vibrations in the MoS2 layer during cooling. Our results demonstrate that Raman spectroscopy is a feasible tool for investigating the thermal properties of few-layer MoS2 and will provide useful information for its further application in photoelectronic devices.
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