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Published on: October 23, 2018
Electrical Characterizations of Planar Ga2O3 Schottky Barrier Diodes
Shiyu Zhang1, Zeng Liu1,2,3, Yuanyuan Liu4,5
1Laboratory of Information Functional Materials and Devices, School of Science & State Key Laboratory of Information Photonics and Optical Communications, Beijing University of Posts and Telecommunications, Beijing 100876, China.
Abstract:
In this work, a Schottky barrier diode (SBD) is fabricated and demonstrated based on the edge-defined film-fed grown (EFG) Ga2O3 crystal substrate. At the current stage, for high resistance un-doped Ga2O3 films and/or bulk substrates, the carrier concentration (and other electrical parameters) is difficult to be obtained by using the conventional Hall measurement. Therefore, we extracted the electrical parameters such as on-state resistance (R), Schottky barrier height (ϕB), the ideal factor (n), series resistance (R) and the carrier concentration (N) by analyzing the current density-voltage (J-V) and capacitance-voltage (C-V) curves of the Ga2O3-based SBD, systematically. The detailed measurements and theoretical analysis are displayed in this paper.
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