High mobility field-effect transistors based on MoS₂crystals grown by the flux method

Two-dimensional (2D) molybdenum disulphide (MoS₂) transition metal dichalcogenides (TMDs) have great potential for use in optical and electronic device applications; however, the performance of MoS₂is limited by its crystal quality, which serves as a measure of the defects and grain boundaries in the grown material. Therefore, the high-quality growth of MoS₂crystals continues to be a critical issue. In this context, we propose the formation of high-quality MoS₂crystals via the flux method. The resulting electrical properties demonstrate the significant impact of crystal morphology on the performance of MoS₂field-effect transistors. MoS₂made with a relatively higher concentration of sulphur (a molar ratio of 2.2) and at a cooling rate of 2.5 °C h^-1yielded good quality and optimally sized crystals. The room-temperature and low-temperature (77 K) electrical transport properties of MoS₂field-effect transistors (FETs) were studied in detail, with and without the use of a hexagonal boron nitride (h-BN) dielectric to address the mobility degradation issue due to scattering at the SiO₂/2D material interface. A maximum field-effect mobility of 113 cm²V^-1s^-1was achieved at 77 K for the MoS₂/h-BN FET following high-quality crystal formation by the flux method. Our results confirm the achievement of large-scale high-quality crystal growth with reduced defect density using the flux method and are key to achieving higher mobility in MoS₂FET devices in parallel with commercially accessible MoS₂crystals.