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High spectro-temporal compression on a nonlinear CMOS-chip.

Ju Won Choi1, Ezgi Sahin1, Byoung-Uk Sohn1

  • 1Photonics Devices and System Group, SUTD-MIT International Design Center, Singapore University of Technology and Design, Singapore, 487372, Singapore.

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Summary
This summary is machine-generated.

Researchers achieved significant optical pulse compression on a chip. They demonstrated 11x temporal and 3x spectral compression of optical pulses using ultra-silicon-rich nitride, enabling advanced all-optical pulse control.

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Area of Science:

  • Photonics and Optical Engineering
  • Materials Science
  • Semiconductor Device Physics

Background:

  • Optical pulses are defined by temporal and spectral properties, crucial for applications like metrology and communications.
  • Controlling these properties is key to advancing optical technologies.

Purpose of the Study:

  • To demonstrate significant temporal and spectral compression of optical pulses on a chip.
  • To explore the use of ultra-silicon-rich nitride for enhanced nonlinear optical effects.

Main Methods:

  • Achieved 11x temporal compression of 5.8 ps pulses to 0.55 ps using low power (13.3 W) on a complementary metal-oxide-semiconductor (CMOS) chip.
  • Demonstrated 3.0x spectral compression of 480 fs pulses while preserving pulse energy.
  • Utilized advanced on-chip device design with ultra-silicon-rich nitride waveguides.

Main Results:

  • The temporal compression resulted in a 9.4x increase in pulse peak power.
  • This represents the strongest temporal compression achieved on a CMOS chip to date.
  • The ultra-silicon-rich nitride exhibited a 500x larger nonlinear parameter than stoichiometric silicon nitride and no two-photon absorption.

Conclusions:

  • The study introduces a new paradigm for spectro-temporal compression of optical pulses.
  • The demonstrated on-chip capabilities pave the way for turn-key, integrated systems for all-optical pulse control.
  • This advancement is critical for future high-speed optical communications and advanced metrology.