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Simple Methods for the Preparation of Non-noble Metal Bulk-electrodes for Electrocatalytic Applications

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MoS₂ with Controlled Thickness for Electrocatalytic Hydrogen Evolution.

Xiaoxuan Xu¹, Lei Liu²

¹Nanjing Vocational University of Industry Technology , Nanjing, 210023, People's Republic of China.

Nanoscale Research Letters

|August 31, 2021

Summary

This summary is machine-generated.

Molybdenum disulfide (MoS2) films grown by atomic layer deposition show optimal hydrogen evolution reaction performance at 14.9 nm thickness. Thicker films reduce catalytic activity and stability.

Keywords:

Atomic layer deposition Hydrogen evolution MoS2 MoS2 thickness

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Area of Science:

Materials Science
Electrochemistry
Catalysis

Background:

Molybdenum disulfide (MoS2) is a promising non-noble metal catalyst for the hydrogen evolution reaction (HER).
The catalytic performance of MoS2 is highly dependent on its thickness and interface properties.
Atomic layer deposition (ALD) offers precise control over film thickness and morphology.

Purpose of the Study:

To investigate the effect of MoS2 film thickness on HER performance.
To optimize MoS2 film growth for enhanced catalytic activity and stability.
To explore ALD as a method for fabricating binder-free MoS2/glassy carbon (GC) HER catalysts.

Main Methods:

Direct growth of MoS2 films on GC substrates using ALD with varying cycle numbers.
Characterization of MoS2 film thickness and morphology.
Electrochemical evaluation of HER performance using prepared MoS2/GC catalysts without binders.

Main Results:

MoS2 films grown by ALD exhibited tunable thickness.
The optimal HER performance was achieved with MoS2 films corresponding to 200 ALD cycles (14.9 nm thickness).
Excessive MoS2 thickness led to reduced active sites, increased electrical resistance, and lower electron transfer rates, diminishing HER performance and stability.

Conclusions:

ALD is an effective technique for precisely controlling MoS2 film thickness for HER catalysis.
MoS2 film thickness significantly impacts HER activity and stability, with an optimal thickness identified.
The layer-by-layer growth by ALD enhances substrate adhesion, contributing to excellent HER stability.