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Fabrication of Nano-engineered Transparent Conducting Oxides by Pulsed Laser Deposition
Published on: February 27, 2013
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Towards Scalable Large-Area Pulsed Laser Deposition.
Zakhar Vakulov1, Daniil Khakhulin2, Evgeny Zamburg3
1Federal Research Centre, Southern Scientific Centre of the Russian Academy of Sciences (SSC RAS), 41 Chekhov St., 344006 Rostov-on-Don, Russia.
Materials (Basel, Switzerland)
|September 10, 2021
Summary
This study presents a method to calculate film thickness distribution for large substrates in pulsed laser deposition, improving uniformity for microelectronic fabrication. Achieving <5% thickness variation on 300mm substrates is now more attainable.
Area of Science:
- Materials Science
- Thin Film Deposition
- Nanotechnology
Background:
- Pulsed laser deposition (PLD) faces challenges in achieving uniform film thickness on large-diameter substrates (>100 mm) due to small laser spot sizes.
- This limitation hinders mass production of micro- and nanoelectronic devices requiring precise film uniformity.
Purpose of the Study:
- To develop and validate a methodology for calculating film thickness distribution on large substrates during PLD.
- To identify key equipment and technological parameters influencing film uniformity.
- To provide recommendations for optimizing PLD processes for enhanced thickness uniformity.
Main Methods:
- Development of a predictive model for film thickness distribution based on PLD equipment parameters.
- Experimental validation of the modeling methodology.
- Simulation of the influence of various technological parameters on thickness uniformity.
Main Results:
- The proposed methodology accurately predicts film thickness distribution, with experimental discrepancies not exceeding 8%.
- Modeling identified critical parameters affecting film uniformity.
- Optimized parameters enable achieving thickness distribution <5% over approximately 31% of a 300 mm diameter substrate.
Conclusions:
- The developed methodology provides a reliable tool for predicting and improving film thickness uniformity in large-area PLD.
- The findings offer practical guidance for optimizing PLD processes in micro- and nanoelectronic manufacturing.
- This research contributes to advancing mass-production technologies for high-quality thin films.
