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Updated: Oct 13, 2025

Atomically Defined Templates for Epitaxial Growth of Complex Oxide Thin Films
Published on: December 4, 2014
Semiconductor Epitaxy in Superconducting Templates.
Markus F Ritter1, Heinz Schmid1, Marilyne Sousa1
1IBM Research Europe, Säumerstrasse 4, 8803 Rüschlikon, Switzerland.
Researchers developed a new method to integrate semiconductor-superconductor devices on silicon. This technique enables the creation of hybrid devices with sharp interfaces, showing proximity-induced superconductivity in indium arsenide (InAs).
Area of Science:
- Materials Science
- Condensed Matter Physics
- Nanotechnology
Background:
- Scalable integration of semiconductor-superconductor devices is crucial for advanced electronics.
- Current methods face challenges in achieving high-quality interfaces and compatibility with existing architectures.
Purpose of the Study:
- To demonstrate a novel monolithic integration technique for semiconductor-superconductor devices on silicon.
- To enable the growth of hybrid devices with precise control over interfaces and alignment.
Main Methods:
- Monolithic growth of indium arsenide (InAs) nanowires on silicon within lateral cavities.
- Incorporation of superconducting titanium nitride (TiN) elements.
- Electrical characterization at low temperatures.
Main Results:
- Achieved sharp semiconductor-superconductor interfaces between InAs and TiN.
- Demonstrated successful integration of InAs nanowires on silicon.
- Observed proximity-induced superconductivity in InAs through a transparent interface.
Conclusions:
- The developed technique overcomes key challenges in integrating hybrid devices.
- This approach facilitates the creation of novel superconducting devices compatible with silicon technology.
- The findings pave the way for practical implementation of semiconductor-superconductor devices.
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