In-situ Near-Field Probe Microscopy of Plasma Processing

Area of Science:

• Materials Science
• Surface Science
• Nanotechnology

Background:

• * Current in situ nanoscale surface and thin film characterization during plasma treatments is limited.
• * Existing methods include 'post mortem' microscopy or in situ optical techniques lacking nanoscale resolution.

Purpose of the Study:

• * To introduce scanning near-field microwave microscopy (SNMM) for nanoscale monitoring of plasma-assisted processes.
• * To demonstrate SNMM's capability for submicron spatial resolution in plasma environments.

Main Methods:

• * Developed an SNMM approach using a SiN membrane to isolate the plasma environment from the probe.
• * Imaged transformations of carbon nanotube films during plasma-induced oxidation.

Main Results:

• * Successfully monitored gradual transformations of carbon nanotube films.
• * Achieved submicron spatial resolution for plasma-assisted process characterization.
• * Demonstrated the feasibility of imaging through a thin SiN membrane.

Conclusions:

• * SNMM provides a viable method for nanoscale in situ characterization during plasma treatments.
• * The technique allows monitoring of material changes, such as plasma-induced oxidation.
• * Further development is needed for real-time imaging during active plasma conditions.