Ultrahigh efficient spin orbit torque magnetization switching in fully sputtered topological insulator and
Tuo Fan1, Nguyen Huynh Duy Khang1,2, Soichiro Nakano1
1Department of Electrical and Electronic Engineering, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro, Tokyo, 152-8550, Japan.
Abstract:
Spin orbit torque (SOT) magnetization switching of ferromagnets with large perpendicular magnetic anisotropy has a great potential for the next generation non-volatile magnetoresistive random-access memory (MRAM). It requires a high performance pure spin current source with a large spin Hall angle and high electrical conductivity, which can be fabricated by a mass production technique. In this work, we demonstrate ultrahigh efficient and robust SOT magnetization switching in fully sputtered BiSb topological insulator and perpendicularly magnetized Co/Pt multilayers. Despite fabricated by the magnetron sputtering instead of the laboratory molecular beam epitaxy, the topological insulator layer, BiSb, shows a large spin Hall angle of θSH = 10.7 and high electrical conductivity of σ = 1.5 × 105 Ω-1 m-1. Our results demonstrate the feasibility of BiSb topological insulator for implementation of ultralow power SOT-MRAM and other SOT-based spintronic devices.
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