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Preparation of Macroporous Epitaxial Quartz Films on Silicon by Chemical Solution Deposition

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Mesoscopic Structures and Coexisting Phases in Silica Films.

Kristen M Burson¹, Hyun Jin Yang², Daniel S Wall¹

¹Hamilton College, 198 College Hill Road, Clinton, New York 13323, United States.

The Journal of Physical Chemistry. C, Nanomaterials and Interfaces

|March 4, 2022

Summary

Mesoscale structures in silica films, examined using scanning tunneling microscopy (STM), reveal rich structural diversity. These findings are crucial for understanding confined space reactions and applications of silica films.

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Epitaxial Nanostructured α-Quartz Films on Silicon: From the Material to New Devices

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Published on: October 6, 2020

Area of Science:

Materials Science
Surface Science
Nanotechnology

Background:

Silica films are unique two-dimensional systems with crystalline and vitreous forms.
Research has primarily focused on atomic-scale features, overlooking mesoscale structures.
Mesoscale structures are important for confined space reactions and silica film applications.

Purpose of the Study:

To investigate mesoscale structures in silica films grown under ultrahigh vacuum.
To understand the influence of holes and substrate steps on silica film mesoscale structures.
To characterize the structural diversity of silica films at the mesoscale.

Main Methods:

Growth of silica films under ultrahigh vacuum conditions.
Examination of silica film structures using scanning tunneling microscopy (STM).
Analysis of coexisting monolayer, zigzag, and bilayer phases.

Main Results:

Silica films exhibit coexisting monolayer, zigzag, and bilayer phases.
Holes and substrate steps significantly influence these mesoscale phases.
Vitreous character observed near holes in bilayer films, even within crystalline regions.
Mixed phases and varying silicon densities observed at step edges depending on coverage.

Conclusions:

Silica films display significant structural diversity at the mesoscale.
Mesoscale structural features are influenced by film topology (holes) and substrate morphology (steps).
Understanding mesoscale structures is key for advancing silica film applications.