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Published on: February 11, 2020
Separation of Neighboring Terraces on a Flattened Si(111) Surface by Selective Etching along Step Edges Using Total
Zhida Ma1, Seiya Masumoto1, Kentaro Kawai1
1Department of Precision Engineering, Graduate School of Engineering, Osaka University, 2-1, Yamada-oka, Suita, Osaka 565-0871, Japan.
Abstract:
We propose a bottom-up technique using total wet chemical treatments to separate neighboring terraces on Si(111). First, Ag cations were reduced at the step edges of a vicinal Si(111) surface composed of biatomic steps and flat terraces, resulting in self-assembled Ag rows consisting of nanodots and nanowires. By immersing this sample into a mixed solution of HF and H2O2, almost continuous nanotrenches with depths and widths of nanometer scales were fabricated along the edges. The potential electrochemical processes in the solution/Ag/Si system that lead to the formation of nanotrenches are discussed. Additionally, we present how we plan to use our approach to create atomic-thickness Si ribbons.

