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Updated: Sep 29, 2025

Plasma-assisted Molecular Beam Epitaxy of N-polar InAlN-barrier High-electron-mobility Transistors
Published on: November 24, 2016
Jingwei Guo1, Shengdong Hu1, Ping Li1,2
1Chongqing Engineering Laboratory of High Performance Integrated Circuits, School of Microelectronics and Communication Engineering, Chongqing University, Chongqing 400044, China.
This study introduces a novel compound buffer layer for high electron mobility transistors (HEMTs), significantly boosting breakdown voltage without compromising performance. The new design enhances device reliability for power electronics applications.
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