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Atomic Force Microscopy

Atomic Force Microscopy

Atomic force microscopy (AFM) is a type of scanning probe microscopy that can analyze topographic details of various specimens like ceramics, glass, polymers, and biological samples. AFM offers over 1000 times more resolution than the optical imaging system. Images generated from AFM are three-dimensional surface profiles, offering an advantage over the flat, two-dimensional images from other imaging techniques.
The AFM Probe
The probe is regarded as the heart of any AFM setup and comprises the...

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Updated: Sep 27, 2025

Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes

Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes

Published on: January 19, 2020

Toward Single-Atomic-Layer Lithography on Highly Oriented Pyrolytic Graphite Surfaces Using AFM-Based Electrochemical

Wei Han^1,2, Paven Thomas Mathew¹, Srikanth Kolagatla^3,4

¹Centre of Micro/Nano Manufacturing Technology (MNMT-Dublin), University College Dublin, Dublin, D04 V1W8 Ireland.

Nanomanufacturing and Metrology

|April 11, 2022

Summary

This summary is machine-generated.

Atomic force microscopy (AFM) electrochemical etching enables single-atomic-layer lithography on graphite surfaces. This technique precisely removes material atom-by-atom, creating intricate nanoscale patterns with potential for advanced fabrication.

Keywords:

Atomic and close-to-atomic scale manufacturing (ACSM)Electrochemical machining Etching Lithography

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Writing and Low-Temperature Characterization of Oxide Nanostructures

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Published on: July 18, 2014

Area of Science:

Materials Science
Nanotechnology
Surface Science

Background:

Atomic force microscopy (AFM) is a key tool for nanoscale surface analysis and manipulation.
Achieving single-atomic-layer precision in surface patterning remains a significant challenge in nanofabrication.

Purpose of the Study:

To investigate the feasibility of AFM-based electrochemical etching for single-atomic-layer lithography on highly oriented pyrolytic graphite (HOPG).
To explore the conditions required for creating intricate patterns like nano-holes and nano-lines using this method.

Main Methods:

Electrochemical etching of HOPG using an AFM tip in a water meniscus under controlled high humidity (75%).
Investigating the influence of applied potential and AFM tip wear on etching precision.
Analyzing the byproducts of the electrochemical reactions.

Main Results:

AFM-based electrochemical etching demonstrated the potential for single-atomic-layer material removal.
Debris generation was observed due to incomplete gasification of carbon intermediates during etching.
Applied potential and AFM tip wear critically affect etching precision.

Conclusions:

AFM-based electrochemical etching offers a promising route for atom-by-atom material removal and precise nanofabrication.
Optimizing etching parameters and mitigating debris formation are crucial for realizing the full potential of this technique.