Related Experiment Video
Updated: Sep 23, 2025

08:45
Fabrication of Spatially Confined Complex Oxides
Published on: July 1, 2013
9.7K
A rapid and cost-effective metallization technique for 3C-SiC MEMS using direct wire bonding
Abu Riduan Md Foisal1, Hoang-Phuong Phan1, Toan Dinh1
1Queensland Micro-Nanotechnology Centre, Griffith University Queensland Australia ar.mdfoisal@griffithuni.edu.au.
RSC Advances
|May 11, 2022
Summary
Researchers developed a simple ultrasonic wire bonding method for silicon carbide (SiC) MEMS devices. This technique enables direct aluminum wire bonding to SiC, offering strong adhesion and reliable electrical contact for microelectronic applications.
Area of Science:
- Materials Science
- Electrical Engineering
- Microelectromechanical Systems (MEMS)
Background:
- Traditional wire bonding for silicon carbide (SiC) MEMS devices often requires complex metal deposition and etching processes.
- Achieving reliable electrical contacts on SiC surfaces for device characterization presents a significant challenge.
Purpose of the Study:
- To present a novel, simple, rapid, and cost-effective wire bonding technique for single crystalline silicon carbide (3C-SiC) MEMS devices.
- To demonstrate the feasibility of direct aluminum wire bonding onto SiC films without additional fabrication steps.
Main Methods:
- Utilized direct ultrasonic wedge-wedge bonding to join aluminum wires directly onto 3C-SiC films.
- Characterized the bonded joints for adhesion force and electrical contact properties.
- Fabricated and tested a 3C-SiC strain sensor as a proof of concept.
Main Results:
- Achieved strong adhesion forces of 12.6-14.5 mN between Al wires and SiC surfaces.
- Demonstrated excellent and stable ohmic contact, even at temperatures above 420 K.
- The developed 3C-SiC strain sensor exhibited high sensitivity, excellent repeatability, and reliable electrical contact via the direct bonding method.
Conclusions:
- The proposed direct ultrasonic wire bonding technique is a simple and effective method for contacting SiC MEMS devices.
- This approach eliminates the need for metal deposition and etching, reducing fabrication complexity and cost.
- The technique shows significant potential for various SiC-based MEMS and microelectronic applications.

