The effect of work function during electron spectroscopy measurements in Scanning Field-Emission Microscopy
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Updated: Sep 23, 2025

Electrochemical Etching and Characterization of Sharp Field Emission Points for Electron Impact Ionization
Published on: July 12, 2016
Michal Bodik1, Christopher Walker1, Maksym Demydenko1
1Laboratorium für Festkörperphysik, ETH Zürich, Zürich CH-8093, Switzerland.
Abstract:
Electron spectroscopy proves to be a handy tool in material science. Combination of electron spectroscopy and scanning probe microscopy is possible through Scanning Field Emission Microscopy (SFEM), where a metallic probe positioned close to the surface is used as an electron source. However, using this not too much technologically demanding technique, it looks like the compromise between the lateral resolution and spectroscopic clarity must be considered. Here, we demonstrate, using experimental and simulation data, that the spectroscopic information can be understood without the need to grossly deteriorate the potential spatial resolution of the microscope. We prepared a three-section sample with clean W(110), sub-monolayer Cs on W(110) and monolayer of Cs on W(110) on which electron energy loss spectra are obtained via Scanning Probe Energy Loss Spectroscopy (SPELS) measurements. To explain the detected spectra a new model describing SPELS measurements in a SFEM is developed which aids to uncover the origin of spectral features typically detected during experiments. Experimental and simulation data are in a mutual agreement and observed spectral features on different surfaces could be explained. This novel understanding of SPELS can solve the main issue previously related to this technique, and good spatial resolution can be accompanied by the understanding of the measured spectra.
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