Dielectric Polarization in a Capacitor
Potential Due to a Polarized Object
Ferromagnetism
Biasing of Metal-Semiconductor Junctions
Group Polarization
Biasing of P-N Junction
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A Fabrication and Measurement Method for a Flexible Ferroelectric Element Based on Van Der Waals Heteroepitaxy
Published on: April 8, 2018
Ekaterina Kondratyuk1, Anastasia Chouprik1
1Moscow Institute of Physics and Technology, 9 Institutskiy Lane, 141700 Dolgoprudny, Russia.
Ferroelectric hafnium oxide (HfO2) thin films are key for memory devices. This study proposes a new model explaining polarization switching behavior in hafnium zirconium oxide (HZO) thin films.
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