Biasing of Metal-Semiconductor Junctions
Characteristics of MOSFET
Biasing of FET
Biasing of P-N Junction
Metal-Semiconductor Junctions
MOSFET: Depletion Mode
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Plasma-assisted Molecular Beam Epitaxy of N-polar InAlN-barrier High-electron-mobility Transistors
Published on: November 24, 2016
Yuan Lin1, Min-Lu Kao1, You-Chen Weng2
1Department of Materials Science and Engineering, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan.
Investigating substrate voltage (VSUB) in Gallium Nitride on Silicon (GaN-on-Si) high electron mobility transistors (HEMTs) reveals its impact on device performance. Applying specific VSUB levels can enhance breakdown voltage and dynamic on-resistance by managing charge traps.
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