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Canny Algorithm Enabling Precise Offline Line Edge Roughness Acquisition in High-Resolution Lithography.

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  • 1Institute of Nuclear and New Energy Technology, Tsinghua University, Beijing100084, China.

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Summary

This study introduces new image processing software for measuring line edge roughness (LER) in photoresists. The software provides a user-friendly and efficient tool for evaluating lithographic patterns, crucial for developing advanced photoresist materials.

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Area of Science:

  • Materials Science
  • Nanotechnology
  • Image Processing

Background:

  • Line edge roughness (LER) is a critical metric for photoresist imaging performance.
  • Current LER measurement methods rely on expensive critical dimension scanning electron microscopy (CD-SEM), limiting comprehensive photoresist evaluation.
  • Existing research often overlooks LER, focusing instead on resolution and sensitivity.

Purpose of the Study:

  • To develop and validate an image processing software for offline LER calculation.
  • To enable reliable LER analysis from commonly available SEM images.
  • To provide an efficient and accessible tool for photoresist material development.

Main Methods:

  • Developed image processing software utilizing an adjustable double threshold algorithm.
  • Validated the software using SEM images from extreme ultraviolet (EUV) and electron beam (EB) lithography.
  • Tested the software's ability to analyze lithographic patterns with resolutions down to approximately 15 nm.

Main Results:

  • The software successfully processes graphic files from standard SEM machines.
  • Achieved reliable LER calculation for high-resolution lithographic patterns.
  • Demonstrated efficient and user-friendly operation for offline LER analysis.

Conclusions:

  • The developed software offers a powerful and accessible tool for LER measurement.
  • Facilitates a more thorough evaluation of photoresist imaging performance.
  • Aims to accelerate the advancement of high-performance photoresist materials.