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Ultrafast 3D nanofabrication via digital holography
Wenqi Ouyang1, Xiayi Xu1,2, Wanping Lu1
1Department of Mechanical and Automation Engineering, The Chinese University of Hong Kong, Shatin, Hong Kong.
Nature Communications
|March 27, 2023
Summary
Researchers developed a digital holography-based two-photon lithography (TPL) platform for rapid, high-resolution 3D printing. This advanced TPL system achieves 90 nm resolution and significantly boosts fabrication speed for nanotechnology applications.
Area of Science:
- Nanotechnology
- Advanced Materials Science
- Optical Engineering
Background:
- Fabricating high-resolution, complex three-dimensional (3D) structures is crucial in nanotechnology.
- Existing two-photon lithography (TPL) methods offer high resolution but suffer from slow writing speeds and high costs, limiting large-scale applications.
Purpose of the Study:
- To develop a high-speed, cost-effective TPL platform for fabricating complex 3D nanostructures.
- To overcome the limitations of conventional TPL for large-scale manufacturing and advanced optical device fabrication.
Main Methods:
- Implementation of a digital holography-based TPL platform.
- Utilizing parallel printing with up to 2000 individually programmable laser foci.
- Employing a low-repetition-rate regenerative laser amplifier operating at 1 kHz for single-pulse feature definition.
Main Results:
- Achieved a fabrication resolution of 90 nm for complex 3D structures.
- Significantly enhanced fabrication rate to 2,000,000 voxels/sec.
- Successfully fabricated centimeter-scale metastructures and optical devices, validating performance metrics.
Conclusions:
- The digital holography TPL platform offers a viable solution for scaling up 3D nanoprinting.
- This method effectively addresses the speed and cost limitations of traditional TPL.
- The technology enables applications beyond laboratory prototyping, paving the way for industrial use.

