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Updated: Jul 24, 2025

Elaborate Control of Inkjet Printer for Fabrication of Chip-based Supercapacitors
Published on: November 30, 2021
Laser maskless fast patterning for multitype microsupercapacitors
Yongjiu Yuan1,2,3,4, Xin Li5,6,7, Lan Jiang8,9,10
1Laser Micro/Nano-Fabrication Laboratory, School of Mechanical Engineering, Beijing Institute of Technology, Beijing, PR China.
Abstract:
Downsizing electrode architectures have significant potential for microscale energy storage devices. Asymmetric micro-supercapacitors play an essential role in various applications due to their high voltage window and energy density. However, efficient production and sophisticated miniaturization of asymmetric micro-supercapacitors remains challenging. Here, we develop a maskless ultrafast fabrication of multitype micron-sized (10 × 10 μm2) micro-supercapacitors via temporally and spatially shaped femtosecond laser. MXene/1T-MoS2 can be integrated with laser-induced MXene-derived TiO2 and 1T-MoS2-derived MoO3 to generate over 6,000 symmetric micro-supercapacitors or 3,000 asymmetric micro-supercapacitors with high-resolution (200 nm) per minute. The asymmetric micro-supercapacitors can be integrated with other micro devices, thanks to the ultrahigh specific capacitance (220 mF cm-2 and 1101 F cm-3), voltage windows in series (52 V), energy density (0.495 Wh cm-3) and power density (28 kW cm-3). Our approach enables the industrial manufacturing of multitype micro-supercapacitors and improves the feasibility and flexibility of micro-supercapacitors in practical applications.
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