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Selection Criteria for Small-Molecule Inhibitors in Area-Selective Atomic Layer Deposition: Fundamental Surface
Alfredo Mameli1, Andrew V Teplyakov2
1TNO-Holst Centre, High Tech Campus 31, 5656 AE Eindhoven, The Netherlands.
Accounts of Chemical Research
|July 18, 2023
Summary
Small molecule inhibitors (SMIs) enable selective atomic processing in microelectronics fabrication. This study outlines a roadmap for designing effective SMIs by analyzing surface chemistry and reactivity, moving beyond trial-and-error selection.
Area of Science:
- Surface Chemistry and Materials Science
- Atomic Precision Fabrication
- Microelectronics Engineering
Background:
- Atomic processing requires highly selective surface reactions for microelectronics.
- Small molecule inhibitors (SMIs) are used to control growth on specific surfaces.
- Selectivity is often lost due to surface defects and molecular reactivity variations.
Purpose of the Study:
- To outline approaches for designing effective small molecule inhibitors (SMIs).
- To provide a roadmap for selecting SMIs based on fundamental surface chemistry principles.
- To move beyond trial-and-error methods in SMI selection for atomic processing.
Main Methods:
- Applying classical surface chemistry concepts to design SMIs.
- Analyzing SMI effectiveness based on selectivity, stability, volatility, and adsorption.
- Considering steric hindrance, geometry, packing, and reaction kinetics for SMI selection.
Main Results:
- A systematic approach to SMI design is presented, integrating surface reactivity analysis.
- Key parameters for SMI selection include adsorption strength, reaction kinetics, and binding modes.
- The study identifies 'SMI families' for various target surfaces.
Conclusions:
- Fundamental surface chemistry knowledge is crucial for designing effective SMIs.
- A structured roadmap can guide the selection of SMIs, improving atomic processing.
- This approach enhances selectivity and reliability in microelectronics fabrication.
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