You might also read
Articles linked to this work by shared authors, journal, and citation graph.
Updated: Jul 20, 2025

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
Published on: September 14, 2018
Taewoo Ko1, Samir Kumar1, Sanghoon Shin1
1Department of Electronics and Information Engineering, Korea University, Sejong 30019, Republic of Korea.
Researchers developed a new electron beam lithography method to precisely pattern quantum dots (QDs) into nano-patterns. This technique enables smaller, more reproducible QD patterns for advanced electronics and biomedical sensors.
07:47Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography
Published on: February 12, 2017
09:06Expanding Nanopatterned Substrates Using Stitch Technique for Nanotopographical Modulation of Cell Behavior
Published on: December 8, 2016
Area of Science:
Background:
Purpose of the Study:
Main Methods:
Main Results:
Conclusions: