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Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes
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Editorial for the Special Issue on Recent Advances in Reactive Ion Etching and Applications of High-Aspect-Ratio
Lucia Romano1,2, Konstantins Jefimovs2
1Institute for Biomedical Engineering, University and ETH Zürich, 8092 Zürich, Switzerland.
Micromachines
|August 26, 2023
Abstract:
Reactive ion etching (RIE) is the dominating technology for micromachining semiconductors with a high aspect ratio (HAR) [...].
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