Angle-resolving spectral ellipsometry using structured light for direct measurement of ellipsometric parameters
Applied Optics
|December 1, 2023
Summary
We developed a novel angle-resolving spectral ellipsometry technique using structured light. This method precisely measures thin film properties without moving parts, offering high resolution in both wavelength and incidence angle.
Area of Science:
- Optics and Photonics
- Materials Science
- Nanotechnology
Background:
- Traditional ellipsometry often requires complex optical setups and moving components.
- Achieving high resolution in both spectral and angular domains simultaneously presents a significant challenge.
Purpose of the Study:
- To introduce a compact and efficient angle-resolving spectral ellipsometry system.
- To demonstrate a novel method for precise thin-film characterization using structured light.
Main Methods:
- Utilizing a digital micro-mirror device (DMD) to generate structured light patterns.
- Illuminating the back focal plane of a high numerical aperture (NA) objective lens.
- Employing a spectrometer for spectral acquisition and a fiber for micro-scale spot size reduction.
Main Results:
- Direct measurement of ellipsometric parameters with high resolution in wavelength (0.7 nm) and incidence angle (<1°).
- Demonstrated precise thin-film thickness measurements from 410 to 700 nm.
- Validated accuracy and precision against a commercial ellipsometer.
Conclusions:
- The proposed DMD-based spectral ellipsometry offers a simplified, faster, and highly accurate method for thin-film analysis.
- This technique eliminates the need for rotating optical components, enhancing system robustness.
- The system is capable of precise characterization of thin films in both spectral and angular domains.


