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Efficient Retrieval of Images with Irregular Patterns Using Morphological Image Analysis: Applications to Industrial
Jiajun Zhang1, Georgina Cosma1, Sarah Bugby2
1Department of Computer Science, School of Science, Loughborough University, Loughborough LE11 3TT, UK.
Journal of Imaging
|December 22, 2023
Summary
This study introduces a novel image retrieval framework using DefChars morphological features for identifying irregular patterns in industrial and healthcare images. The DefChars and Manhattan distance approach achieved 80% mean average precision, outperforming deep-learning methods.
Area of Science:
- Computer Vision
- Image Analysis
- Pattern Recognition
Background:
- Image retrieval commonly uses visual content and features.
- Retrieving irregular patterns in industrial/healthcare images is crucial for fault inspection, disease diagnosis, and maintenance prediction.
- Existing methods often rely on deep features, color, shape, or local features.
Purpose of the Study:
- To propose a novel image retrieval framework (ImR) for detecting similar irregular patterns.
- To extract morphological features (DefChars) for enhanced pattern identification.
- To evaluate the framework's performance against various feature extraction methods and distance metrics.
Main Methods:
- The proposed framework extracts a set of morphological features (DefChars) from images.
- Datasets included wind turbine blade defects, COVID-19 CT scans, heatsink defects, and lake ice images.
- Evaluated DefChars against resized raw images, local binary patterns, and scale-invariant feature transforms, using multiple distance metrics.
Main Results:
- The DefChars feature combined with the Manhattan distance metric achieved 80% mean average precision (MAP).
- This combination demonstrated a low standard deviation of ±0.09 across irregular pattern classes.
- The ImR framework outperformed the state-of-the-art deep-learning approach (Super Global) by 8.71% across all datasets.
Conclusions:
- The proposed ImR framework effectively retrieves images with irregular patterns using DefChars and Manhattan distance.
- This method offers superior performance compared to existing feature-metric combinations and deep-learning approaches.
- The framework shows significant potential for applications in industrial inspection and medical diagnostics.

