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A thermal deformation optimization method for cryogenically cooled silicon crystal monochromators under high heat
Jiayin Liu1, Zhan Ji1, Yichen Fan1
1Synchrotron Radiation Facility, Institute of Advanced Science Facilities, Guangming, Shenzhen, Guangdong 518107, People's Republic of China.
Journal of Synchrotron Radiation
|January 22, 2024
Summary
Optimizing silicon crystal monochromators for intense X-rays involves a novel partial cooling method. This technique minimizes thermal deformation, ensuring precision for advanced synchrotron radiation sources.
Area of Science:
- X-ray optics
- Materials science
- Synchrotron radiation technology
Background:
- High-intensity X-rays at modern synchrotron sources cause thermal deformation in crystal monochromators.
- Optimizing thermal management is crucial for maintaining the precision of X-ray optics.
Purpose of the Study:
- To develop and present a method for optimizing the thermal deformation of indirectly cryo-cooled silicon crystal monochromators.
- To ensure precise X-ray beam control under intense irradiation conditions.
Main Methods:
- Studied thermal-induced slope error based on heat transfer, temperature distribution, and beam footprint.
- Proposed a partial cooling method by modifying the cooling contact area.
- Investigated optimal crystal temperature across various photon energies.
Main Results:
- The partial cooling method flattens the crystal surface profile within the beam footprint.
- Achieved a crystal thermal distortion not exceeding 0.3 µrad at 8.33 keV for absorbed power up to 300 W.
- Demonstrated effective thermal distortion control over a wide photon energy range.
Conclusions:
- The proposed partial cooling strategy successfully optimizes thermal deformation in silicon crystal monochromators.
- This method provides essential references for designing monochromators at diffraction-limited synchrotron radiation and free-electron laser facilities.
