MOS Capacitor
Biasing of Metal-Semiconductor Junctions
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Updated: Jul 1, 2025

In Situ Transmission Electron Microscopy with Biasing and Fabrication of Asymmetric Crossbars Based on Mixed-Phased a-VOx
Published on: May 13, 2020
Juan B Roldán1, Antonio Cantudo1, David Maldonado1,2
1Departamento de Electrónica y Tecnología de Computadores, Universidad de Granada, Facultad de Ciencias. Avenida Fuentenueva s/n, 18071 Granada, Spain.
This study introduces a new method for characterizing resistive switching devices by simultaneously measuring electrical and thermal responses. This approach accurately determines thermal resistance for improved circuit simulations.
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